The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Dec. 22, 2008
Hiromichi Hara, Utsunomiya, JP;
Yasuyo Kawabata, Utsunomiya, JP;
Hiromichi Hara, Utsunomiya, JP;
Yasuyo Kawabata, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system. The exposure apparatus includes a setting leg, platens, andon which at least one of a reticle stage apparatusconfigured to hold the original, the projection optical system, a wafer stage apparatusconfigured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanismwhich is provided between the platens, andand the setting legand configured to reduce a vibration, and a filling memberformed by hardening a hardening type liquidwhich is filled between the setting legand a setting floor
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile