The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Jul. 13, 2010
Applicants:
Kenichi Meguro, Kaisei, JP;
Hiroyuki Hoshiya, Odawara, JP;
Keizou Katou, Hachiouji, JP;
Yasunori Abe, Nagaokakyo, JP;
Inventors:
Kenichi Meguro, Kaisei, JP;
Hiroyuki Hoshiya, Odawara, JP;
Keizou Katou, Hachiouji, JP;
Yasunori Abe, Nagaokakyo, JP;
Assignee:
Hitachi Metals, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 33/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
To provide a method which can define the direction and orientation of magnetization of a pinned layer while reducing the number of steps of forming a GMR film. The magnetization direction of the pinned layer is defined in a plurality of directions by forming a plurality of patterns having directivities. Further, when the magneto-resistive effect film is formed, a magnetic field is applied in a direction at an angle set between the angles of the plurality of patterns.