The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Jul. 01, 2009
Applicants:
Zhaoquing Liu, Shanghai, CN;
Daobing Lin, Shanghai, CN;
Qiaobo LI, Shanghai, CN;
Inventors:
Assignee:
Solvay (China) Co., Ltd., Shanghai, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 63/66 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention discloses a process for producing a polyether-polyester block copolymer with a di(C 1-C 4)alkyl ester of aromatic dicarboxylic acid, an aliphatic diol or aliphatic polyol and a polyether having at least one terminal hydroxyl group in an inert solvent. In the present invention, the inert solvent 5 is used to prevent the di(C 1-C 4)alkyl ester of aromatic dicarboxylic acid from sublimation instead of excessive polyol, such that the subsequent removal of excessive polyol under high temperature and high vacuum is avoided.