The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Mar. 15, 2011
Applicants:
Nitin Vilas Tople, Delmar, NY (US);
Gerardo Rocha-galicia, Clifton Park, NY (US);
Hua Guo, Selkirk, NY (US);
Inventors:
Nitin Vilas Tople, Delmar, NY (US);
Gerardo Rocha-Galicia, Clifton Park, NY (US);
Hua Guo, Selkirk, NY (US);
Assignee:
SABIC Global Technologies B.V., Pittsfield, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
C08G 63/18 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention is directed to a method for producing poly(arylene) ethers with improved particle size characteristics. The improved particle size characteristics of the polyphenylene ether include one or both of: (i) up to about 50 weight percent of particles smaller than 38 micrometers; and a (ii) mean particle size greater than 100 or more micrometers.