The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Aug. 16, 2010
Applicants:
Lars Markwort, Haimhausen, DE;
Reza Kharrazian, Stephanskirchen, DE;
Christoph Kappel, Aschheim, DE;
Pierre-yves Guittet, München, DE;
Inventors:
Lars Markwort, Haimhausen, DE;
Reza Kharrazian, Stephanskirchen, DE;
Christoph Kappel, Aschheim, DE;
Pierre-Yves Guittet, München, DE;
Assignee:
Nanda Technologies GmbH, Unterschleissheim, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/66 (2006.01); G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A wafer inspection method comprises imaging a full surface of the wafer at an imaging resolution insufficient to resolve individual microstructures which are repetitively arranged on the wafer. A maskis applied to the recorded image and unmasked portionsof the image are further processed by averaging. The unmasked portionsare selected such that they include memory portions of the wafer.