The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2014

Filed:

Dec. 27, 2010
Applicants:

Min-chul Suh, Yongin, KR;

Sin-doo Lee, Seoul, KR;

Won-suk Choi, Seoul, KR;

Min-hoi Kim, Yongin-Si, KR;

Inventors:

Min-Chul Suh, Yongin, KR;

Sin-Doo Lee, Seoul, KR;

Won-Suk Choi, Seoul, KR;

Min-Hoi Kim, Yongin-Si, KR;

Assignees:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

SNU R&DB Foundation, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer on a substrate; selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a solvent, and forming the remaining second organic layer as a second organic layer pattern.


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