The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Apr. 15, 2011
Anne Hiltner, Cleveland, OH (US);
Eric Baer, Cleveland Heights, OH (US);
Yijian Lin, Lake Jackson, TX (US);
Joel Carr, Shaker Heights, OH (US);
Anne Hiltner, Cleveland, OH (US);
Eric Baer, Cleveland Heights, OH (US);
Yijian Lin, Lake Jackson, TX (US);
Joel Carr, Shaker Heights, OH (US);
Case Western Reserve University, Cleveland, OH (US);
Abstract
A method of forming a confined crystallization multilayer film includes coextruding a plurality of first polymer layers and a plurality of second polymer layer to form a multilayer film wherein each first polymer layer is sandwiched between second polymer layers and axially orienting the multilayer film at a temperature below the melting temperature (T) of the second polymer layer and to a thickness such that each first polymer layer forms a high aspect ratio substantially crystalline lamellae.