The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Dec. 15, 2010
Choong-ho Lee, Yongin, KR;
Yoon-chan OH, Yongin, KR;
Seung-ho Choi, Yongin, KR;
Suk-won Jung, Yongin, KR;
Jung-soo Rhee, Yongin, KR;
Choong-Ho Lee, Yongin, KR;
Yoon-Chan Oh, Yongin, KR;
Seung-Ho Choi, Yongin, KR;
Suk-Won Jung, Yongin, KR;
Jung-Soo Rhee, Yongin, KR;
Samsung Display Co., Ltd., Gyeonggi-Do, KR;
Abstract
A method of efficiently manufacturing a large-sized mask is disclosed. In one embodiment, the method includes: 1) providing a first mask member comprising i) a first pattern unit having a plurality of slits, ii) a first buffer unit spaced apart from the first pattern unit, and iii) a first bonding unit interconnecting the first pattern unit and the first buffer unit and 2) providing a second mask member comprising i) a second pattern unit having a plurality of slits, ii) a second buffer unit spaced apart from the second pattern unit, and iii) a second bonding unit interconnecting the second pattern unit and the second buffer unit. The method may further include contacting the first bonding unit and the second bonding unit; and connecting the first mask member to the second mask member while tensile forces are applied to the first mask member and the second mask member.