The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Oct. 26, 2010
Seung-hee Nam, Paju-si, KR;
Tae-hyoung Moon, Gwangmyeong-si, KR;
Seung-Hee Nam, Paju-si, KR;
Tae-Hyoung Moon, Gwangmyeong-si, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
The present invention provides device and method for forming a thin film pattern which can maintain an extent of wetting of a printing liquid at a proper state without time dependence. The device for forming a thin film includes a printing liquid supply unit for supplying printing liquid, a cliché having a depressed pattern and a relieved pattern for patterning the printing liquid, a printing roller for having the printing liquid supplied from the printing liquid supply unit thereto coated thereon and being rolled on the cliché and the substrate, and a solvent supply unit for supplying a solvent to the printing liquid before the printing liquid coated on the printing roller is brought into contact with the cliché.