The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Aug. 07, 2012
Michael Rousson, San Jose, CA (US);
Michael Rousson, San Jose, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
Techniques are disclosed for generating landmark models based on exemplar portions of images ('patches') that are known to include the target landmark (forming a 'positive' set of landmark vectors) and those that do not (forming a “negative” set of landmark vectors). Theses sets of positive and negative landmark vectors, along with other landmark statistics, form a landmark model. When an unknown image is received, candidate landmark vectors may be generated based on the image's content (or portion thereof) and applied to the landmark model to rapidly reduce the dimensionality (complexity) of the candidate landmark vector space. Landmark models may be applied to the reduced-dimensioned candidate landmark vectors to identify the most likely point corresponding to the target landmark.