The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Jul. 25, 2013
Applicant:
Empire Technology Development, Llc, Wilmington, DE (US);
Inventors:
Thomas A. Yager, Encinitas, CA (US);
Seth Adrian Miller, Englewood, CO (US);
Assignee:
Empire Technology Development, LLC, Wilmington, DE (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
Technologies are generally described for methods, systems, and structures that include patterns formed by optical lithography. In some example methods, a photoresist layer is applied to a substrate, and a grapheme layer can be applied to the photoresist layer. Light can be applied through a mask to the graphene layer, where the mask includes a pattern. The light can form the pattern on the graphene layer such that the pattern forms on the photoresist layer.