The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2014

Filed:

Dec. 20, 2011
Applicants:

Tohru Kinugawa, Osaka, JP;

Osamu Furuhashi, Uji, JP;

Inventors:

Tohru Kinugawa, Osaka, JP;

Osamu Furuhashi, Uji, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An embodiment with a dual-stage reflectron is as follows: (1) On the assumption that a reflector has a base potential X(U) created by uniform electric fields, its design parameters are adjusted so as to cancel the first and second order derivatives at energy E=Eof a total time of flight T(E), and a second-order focusing position on a central axis at which the potential value becomes zero is determined (Mamyrin solution). (2) A correcting potential X(U) to be superposed on X(U), beginning from the second-order focusing position, is calculated so that T(E) of ions reflected in a region deeper than the second-order focusing position will be constant. (3) Voltage values of the reflector electrodes are determined so that a real potential X(U)=X(U)+X(U) is created on the central axis.


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