The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
May. 31, 2012
Dennis J. Pretti, Boise, ID (US);
Terrence B. Mcdaniel, Boise, ID (US);
Dennis J. Pretti, Boise, ID (US);
Terrence B. McDaniel, Boise, ID (US);
Nanya Technology Corp., Kueishan, Tao-Yuan Hsien, TW;
Abstract
A semiconductor processing method that can generate a hole with different diameters, comprising: providing first material and second material different from the first material; and utilizing a etching process to etch the first material and the second material to form a hole through the first material and the second material; wherein the etching process has different etching rates for the first material and the second material such that the hole have different diameters. A semiconductor structure corresponding to the above-mentioned method is also disclosed.