The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2014

Filed:

May. 09, 2008
Applicants:

Louis L. Hsu, Fishkill, NY (US);

William R. Tonti, Essex Junction, VT (US);

Chih-chao Yang, Glenmont, NY (US);

Inventors:

Louis L. Hsu, Fishkill, NY (US);

William R. Tonti, Essex Junction, VT (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods are provided for fabricating interconnect structures containing various capping materials for electrical fuses and other related applications. The method includes forming a first interconnect structure having a first interfacial structure and forming a second interconnect structure adjacent to the first structure. The second interconnect structure is formed with a second interfacial structure different from the first interfacial structure of the first interconnect structure.


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