The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2014

Filed:

Aug. 29, 2008
Applicants:

Zhijian Shen, Solna, SE;

Saeid Esmaeilzadeh, Stockholm, SE;

Katarina Flodstrom, Stockholm, SE;

Charlotte Vieillard, Woerden, NL;

Inventors:

Zhijian Shen, Solna, SE;

Saeid Esmaeilzadeh, Stockholm, SE;

Katarina Flodstrom, Stockholm, SE;

Charlotte Vieillard, Woerden, NL;

Assignee:

AB SKF, Gothenburg, SE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 35/584 (2006.01); C04B 35/597 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention concerns a method for manufacturing a ceramic material with pseudo-isotropic microstructure. The method for tailoring the microstructure for manufacturing of sintered ceramic components involves a spark plasma sintering (SPS) process. By performing the SPS process in at least two steps it is possible to separate densification from grain growth. An initial sintering step at a first temperature and a first pressure, followed by a controlled grain growth step at a higher temperature and lower pressure makes it possible to manufacture ceramic components with controlled microstructure and improved mechanical properties.


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