The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2014
Filed:
Sep. 30, 2010
Kim Yang Lee, Fremont, CA (US);
Bing Yen, Cupertino, CA (US);
David Kuo, Palo Alto, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Shih-fu Lee, Fremont, CA (US);
Dieter Weller, San Jose, CA (US);
Kim Yang Lee, Fremont, CA (US);
Bing Yen, Cupertino, CA (US);
David Kuo, Palo Alto, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Shih-Fu Lee, Fremont, CA (US);
Dieter Weller, San Jose, CA (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
A method of imprint lithography includes imprinting a first pattern with a first template on a first substrate of a lithographic template. A second pattern is imprinted with a second template on the substrate of the lithographic template. The first pattern and the second pattern at least partially overlap, thus forming a third pattern. The third pattern is lithographically formed on a second substrate with the lithographic template. In an embodiment, the first pattern is a concentric line pattern formed by thin film deposition. In an embodiment, the second pattern is a radial line pattern. In an embodiment the first pattern and the second pattern may have line frequency increased.