The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Sep. 29, 2011
Katsuhiko Hayashi, Nara, JP;
Yasuhiro Tanaka, Hyogo, JP;
Michihiro Yamagata, Osaka, JP;
Fumitomo Yamasaki, Nara, JP;
Katsuhiko Hayashi, Nara, JP;
Yasuhiro Tanaka, Hyogo, JP;
Michihiro Yamagata, Osaka, JP;
Fumitomo Yamasaki, Nara, JP;
Panasonic Corporation, Kadoma-shi, JP;
Abstract
An objective lens element that can suppress occurrence of an aberration is disclosed. Sawtooth-like diffraction structures having different height and cycles (pitches) are provided on an inner part Rand an outer part R, respectively. A curved surface Mextending at an intermediate level of recesses and projections of the sawtooth-like diffraction structure provided on the inner part R, and a curved surface Mextending at an intermediate level of recesses and projections of the sawtooth-like diffraction structure provided on the outer part Rare smoothly connected to each other. Even when wavelength of the light source and/or the environmental temperature change, a phase shift does not occur between the inner part Rand the outer part R, and a decrease in diffraction efficiency and occurrence of an aberration can be suppressed.