The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Jan. 31, 2008
Michael Renne Ty Tan, Menlo Park, CA (US);
Shih-yuan (Sy) Wang, Palo Alto, CA (US);
Wei Wu, Mountain View, CA (US);
Michael Renne Ty Tan, Menlo Park, CA (US);
Shih-Yuan (SY) Wang, Palo Alto, CA (US);
Wei Wu, Mountain View, CA (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
A method of forming a non-polarizing pellicle beamsplitter having a desired power-tap ratio. The method includes the operation of forming a base layer having a base refractive index on a substrate and arranging a plurality of alternating layers having relatively high and low indexes of refraction respectively over the base layer. The thickness of each of the high index and low index layers is selected to substantially eliminate polarization of the optical beam. The method further includes the operation of removing a selected area of the substrate to create an optical pathway comprised of both the base layer and the plurality of alternating layers, and where the optical pathway is configured to transmit and reflect a selected amount of light in the optical beam.