The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
May. 10, 2010
Yoshihiro Ishibe, Utsunomiya, JP;
Yoshihiro Ishibe, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
Objects are to obtain a highly accurate diffraction element that may prevent an intensity decrease of a light beam entering a light receiving unit without a decrease in diffraction efficiency and without a problem of flare or the like, a manufacturing method for the diffraction element, and a spectrometer using the same. A diffraction element () includes a diffraction grating formed on a substrate having a curved surface. In the diffraction element (), the curved surface () has an anamorphic shape formed by pivoting a curved line (I) in a plane about a straight line (II) in the same plane serving as a rotation axis, and gratings () of the diffraction grating () exist in cross sections orthogonal to the rotation axis.