The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Jul. 26, 2012
Akinori Hashimura, Vancouver, WA (US);
Douglas J. Tweet, Camas, WA (US);
Apostolos T. Voutsas, Portland, OR (US);
Akinori Hashimura, Vancouver, WA (US);
Douglas J. Tweet, Camas, WA (US);
Apostolos T. Voutsas, Portland, OR (US);
Sharp Laboratories of America, Inc., Camas, WA (US);
Abstract
A plasmonic polarizer and a method for fabricating the plasmonic polarizer are provided. The method deposits alternating layers of non-metallic film and metal, forming a stack. A hard mask is formed overlying the stack. The hard mask comprises structures having dimensions and periods between adjacent structures less than a first length, where the first length is equal to (a first wavelength of light/2). The stack is etched through openings in the hard mask to form pillar stacks of alternating non-metallic and metal layers having the dimensions of the hard mask structures. Then, the hard mask structures are removed. In one aspect, subsequent to removing the hard mask structures, the spaces between the pillar stacks are filled with a dielectric material.