The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Aug. 25, 2011
Se-yeon Kim, Hwaseong-si, KR;
Hun Jung Yi, Suwon-si, KR;
Sangpyoung Jeon, Suwon-si, KR;
Hyojin Yun, Suwon-si, KR;
Se-Yeon Kim, Hwaseong-si, KR;
Hun Jung Yi, Suwon-si, KR;
Sangpyoung Jeon, Suwon-si, KR;
Hyojin Yun, Suwon-si, KR;
Abstract
A plasma generating unit for a process monitoring device includes a hollow first electrode extending in a length direction and a second electrode extending in the length direction and positioned within and displaced from the first electrode with a distance therebetween. The first electrode has an inner diameter and the second electrode has an outer diameter selected to vary the distance between the electrodes in the length direction so that the plasma generating unit generates a plasma by ionizing a gas flowing between the electrodes at a different position in the length direction based on a pressure of the gas.