The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2014

Filed:

Oct. 15, 2010
Applicants:

Huiqin Shi, Guangdong, CN;

Wei Huang, Guangdong, CN;

Zhao Zhang, Guangdong, CN;

Inventors:

Huiqin Shi, Guangdong, CN;

Wei Huang, Guangdong, CN;

Zhao Zhang, Guangdong, CN;

Assignee:

ZTE Corporation, Shenzhen, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/00 (2011.01); H04N 5/232 (2006.01);
U.S. Cl.
CPC ...
H04N 5/23238 (2013.01);
Abstract

The present invention discloses a method and an apparatus for shooting a panorama, so as to solve the problems in the prior art that images with high quality cannot be obtained in the shooting process of a panorama and the shot images cannot be directly combined into a panorama without post-shooting processing. The method comprises the steps of: calculating, when previewing an image to be shot which is not the first shot image in a panorama, an overlapping degree of a joining region between the image to be shot and a shot image; and shooting the image to be shot when the overlapping degree reaches a set condition. The present invention also discloses an apparatus for shooting a panorama.


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