The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Aug. 24, 2009
David L. Morgan, Iii, Leawood, KS (US);
Ignacio Sanz-pastor, San Francisco, CA (US);
David L. Morgan, III, Leawood, KS (US);
Ignacio Sanz-Pastor, San Francisco, CA (US);
Aechelon Technology, Inc., San Francisco, CA (US);
Abstract
Sampling in the process of trans-raster distortion correction is described. The distortion parameterization is analyzed to determine the maximum inflation and deflation (magnification and minification) over the image. The maximum inflation is then used to determine the optimal resolution (dimensions in pixels) of the linear-projected image such that it is not undersampled by the output image. The maximum deflation, coupled with the optimal resolution determined in the inflation step, is then used to configure the filter used in the resampling process such that aliasing due to undersampling is minimized, while simultaneously controlling the computational burden of the filter.