The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
May. 08, 2012
Takeo Fukui, Tokyo, JP;
Tetsuo Mizuniwa, Tokyo, JP;
Kazuhiko Tokunaga, Fukuoka, JP;
Masako Yasutomi, Fukuoka, JP;
Takeo Fukui, Tokyo, JP;
Tetsuo Mizuniwa, Tokyo, JP;
Kazuhiko Tokunaga, Fukuoka, JP;
Masako Yasutomi, Fukuoka, JP;
Kurita Water Industries Ltd., Tokyo, JP;
Abstract
The invention relates to a method for manufacturing an anion exchange resin, wherein the method includes the step of contacting a water soluble polymer containing an anionic dissociative group with a resin to produce an anion exchange resin. In the method, an amount of contact of the water soluble polymer is 0.01 to 10 mmol/L, in terms of an amount of the anionic dissociative group, relative to 1 liter of the anion exchange resin, and a wafer surface flatness (Rms) of the anion exchange resin is 4 Å or less, determined by a silicon wafer test.