The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Feb. 27, 2012
Jong-hyun Choung, Hwaseong-si, KR;
Ji-young Park, Hwaseong-si, KR;
Seon-il Kim, Seoul, KR;
Sang-gab Kim, Seoul, KR;
In-bae Kim, Asan-si, KR;
Jae-woo Jeong, Incheon, KR;
Jong-Hyun Choung, Hwaseong-si, KR;
Ji-Young Park, Hwaseong-si, KR;
Seon-Il Kim, Seoul, KR;
Sang-Gab Kim, Seoul, KR;
In-Bae Kim, Asan-si, KR;
Jae-Woo Jeong, Incheon, KR;
Samsung Display Co., Ltd., , KR;
Abstract
A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.