The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2014

Filed:

Oct. 19, 2010
Applicants:

Chung-chih Feng, Kaohsiung, TW;

I-peng Yao, Kaohsiung, TW;

Lyang-gung Wang, Kaohsiung, TW;

Yung-chang Hung, Kaohsiung, TW;

Inventors:

Chung-Chih Feng, Kaohsiung, TW;

I-Peng Yao, Kaohsiung, TW;

Lyang-Gung Wang, Kaohsiung, TW;

Yung-Chang Hung, Kaohsiung, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 41/06 (2012.01); B32B 37/12 (2006.01); B29C 65/00 (2006.01); B24B 19/00 (2006.01); C09J 5/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate consists of first elastomer, the first elastomer comprising a plurality of first holes; wherein the first holes have a drop shape, and each of the first holes has an opening. The buffer substrate consists of second elastomer, the second elastomer comprising a plurality of second holes. The surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.


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