The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
Jun. 06, 2013
The Procter & Gamble Company, Cincinnati, OH (US);
Stacey Ann Espinosa, Cincinnati, OH (US);
Cathy Marie Sanders, Cleves, OH (US);
Nakomi Lee Feldman, Cincinnati, OH (US);
Angela Michelle Roberts, West Chester, OH (US);
Marion Janet Lopez Fernandez, West Chester, OH (US);
Jeffrey Glen Sheehan, Cincinnati, OH (US);
Katherine Hope Poli, Cincinnati, OH (US);
The Procter & Gamble Company, Cincinnati, OH (US);
Abstract
A rolled web of cellulosic paper. The rolled web having a machine direction and a cross direction, the rolled web comprising at least two visually distinct repeating emboss patterns of machine direction oriented embossments. Each the repeating emboss pattern comprise a first region comprising a first emboss design and a first width; a second region comprising a second emboss design and a second width; and a third region disposed between and contiguous with the first and second regions, the third region comprising a third emboss design and a third width. Each of the repeating emboss patterns have a repeat pattern width, the repeat pattern width being measured in the cross direction of the rolled web, the repeat pattern width being the sum of the first, second, and third widths of the repeating emboss pattern. Each of the repeating emboss patterns are parallel and separated from each other of the repeating emboss patterns in the cross direction, the separation being by a fourth region having a fourth width in the cross direction, the fourth width being greater than the pattern width.