The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2014

Filed:

Aug. 27, 2010
Applicants:

Tzu-wei Liu, Taichung, TW;

Chian-chi Huang, Taipei, TW;

Min-feng Huang, Taipei, TW;

Inventors:

Tzu-Wei Liu, Taichung, TW;

Chian-Chi Huang, Taipei, TW;

Min-Feng Huang, Taipei, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21S 4/00 (2006.01); F21V 21/00 (2006.01); E04C 2/32 (2006.01); F21V 33/00 (2006.01); E04C 2/20 (2006.01); F21Y 101/02 (2006.01);
U.S. Cl.
CPC ...
E04C 2/326 (2013.01); F21V 33/006 (2013.01); F21Y 2101/025 (2013.01); F21Y 2101/02 (2013.01); E04C 2/20 (2013.01);
Abstract

A building material whereinside an accommodating space is formed is disclosed. The building material includes a first area whereon at least one protruding part and at least one sunken part are formed alternately in a first direction, and a second area whereon at least one protruding part and at least one sunken part are formed alternately in the first direction. The protruding part of the second area aligns with the corresponding sunken part of the first area in a second direction substantially perpendicular to the first direction, and the sunken part of the second area aligns with the corresponding protruding part of the first area in the second direction.


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