The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2014

Filed:

Feb. 23, 2012
Applicants:

Hideo Oguri, Oyama, JP;

Akikazu Miyahara, Oyama, JP;

Inventors:

Hideo Oguri, Oyama, JP;

Akikazu Miyahara, Oyama, JP;

Assignee:

Komatsu Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/02 (2006.01); F01N 11/00 (2006.01); B01D 46/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

There are provided calculating a differential pressure deposition amount of PM deposited in a DPF based on an exhaust gas flow rate and a differential pressure of the DPF, calculating a model deposition amount of the PM using a model in which a PM amount burned in the DPF is subtracted from the PM amount, calculating a time change rate of the differential pressure deposition amount, and setting a first coefficient to be larger than a second coefficient when the exhaust gas flow rate exceeds a predetermined value and setting the first coefficient to be small when the exhaust gas flow rate exceeds the predetermined value and the time change rate is a predetermined threshold or more when multiplying the differential pressure deposition amount and the model deposition amount by the first and second coefficients, respectively, and calculating an addition value of the respective multiplied values as the PM deposition amount.


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