The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Feb. 25, 2013
Hgst Netherlands B.v., Amsterdam, NL;
Masashi Hattori, Odawara, JP;
Kouichi Nishioka, Hiratsuka, JP;
Katsumi Hoshino, Odawara, JP;
Hideki Mashima, Odawara, JP;
HGST Netherlands B.V., Amsterdam, NL;
Abstract
According to one embodiment, a method for forming a magnetic head having a current perpendicular to plan (CPP) sensor, includes forming a magnetoresistance effect film, performing a subtractive process for defining a back edge and a height length of the magnetoresistance effect film, depositing an insulating film adjacent the back edge of the magnetoresistance effect film, and ion milling at least an upper surface of a first portion of the insulating film located closest to the magnetoresistance effect film, where the upper surface of the first portion of the insulating film lies substantially along a plane. After the ion milling, the insulating film has no overlap of the insulating film above and/or onto the magnetoresistance effect film and no bulging in a region immediately adjacent a boundary between the insulating film and the magnetoresistance effect film.