The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2014

Filed:

Dec. 12, 2003
Applicants:

Steven A. Soper, Baton Rouge, LA (US);

Robin L. Mccarley, Prairieville, LA (US);

Bikas Vaidya, College Station, TX (US);

Inventors:

Steven A. Soper, Baton Rouge, LA (US);

Robin L. McCarley, Prairieville, LA (US);

Bikas Vaidya, College Station, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional chemical groups, biomolecules, and metal films have been deposited on poly(carbonate) and poly(methyl methacrylate) surfaces. These patterns may be used, for example, in integrated electronics, capture elements, or sensing elements in micro-fluidic channels.


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