The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2014

Filed:

Jun. 09, 2009
Applicants:

Michael Thomas, Lehrte, DE;

Claus-peter Klages, Braunschweig, DE;

Antje Zanker, Braunschweig, DE;

Inventors:

Michael Thomas, Lehrte, DE;

Claus-Peter Klages, Braunschweig, DE;

Antje Zanker, Braunschweig, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a device for the microstructured plasma treatment of a film substrate, especially of a plastic film. Said device comprises a rotatably received cylindrical electrode the surface of which contains or consists of metal, especially chromium, the surface having microstructured depressions, a planar high-voltage electrode the surface of which has a shape complementary to that of the cylindrical electrode and can be arranged on a section of the surface of the cylindrical electrode in a substantially form-fit manner, a transport device for transporting the film substrate to be treated between the surface of the cylindrical electrode and the high-voltage electrode, and a device for feeding a process gas to the surface of the cylindrical electrode and to the interspace between the cylindrical electrode and the high-voltage electrode.


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