The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Apr. 04, 2006
Kiyoshi Arita, Fukuoka, JP;
Akira Nakagawa, Saga, JP;
Koji Kuga, Fukuoka, JP;
Taiji Matano, Fukuoka, JP;
Nobuhiro Sato, Fukuoka, JP;
Kiyoshi Arita, Fukuoka, JP;
Akira Nakagawa, Saga, JP;
Koji Kuga, Fukuoka, JP;
Taiji Matano, Fukuoka, JP;
Nobuhiro Sato, Fukuoka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
In a plasma processing apparatus for generating a plasma in a plasma generation space between a lower electrode and an upper electrode so that a processing object mounted on the lower electrode is subjected to plasma processing, a plurality of cutout portions for absorption of strain caused by thermal expansion due to rapid temperature increases in the plasma processing are formed at an equal pitch in an outer edge portion of a gas shower plate included in the upper electrode. Thus, the gas shower plate can be prevented from being damaged by occurrence of cracks in the outer edge portion of the gas shower plate or the like.