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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8756777 B1

PDFFull Text
Date of Patent:
Jun. 24, 2014

Filed:

Dec. 28, 2009

Method of manufacturing a ladder filter

Applicants:

Shinji Taniguchi, Kawasaki, JP;

Tokihiro Nishihara, Kawasaki, JP;

Tsuyoshi Yokoyama, Kawasaki, JP;

Masafumi Iwaki, Kawasaki, JP;

Go Endo, Yokohama, JP;

Yasuyuki Saitou, Yokohama, JP;

Hisanori Ehara, Yokohama, JP;

Masanori Ueda, Kawasaki, JP;

Inventors:

Shinji Taniguchi, Kawasaki, JP;

Tokihiro Nishihara, Kawasaki, JP;

Tsuyoshi Yokoyama, Kawasaki, JP;

Masafumi Iwaki, Kawasaki, JP;

Go Endo, Yokohama, JP;

Yasuyuki Saitou, Yokohama, JP;

Hisanori Ehara, Yokohama, JP;

Masanori Ueda, Kawasaki, JP;

Assignee:

Taiyo Yuden Co., Ltd., Tokyo, JP;

Attorney:

Chen Yoshimura LLP

Primary Examiner:

Paul D Kim

Int. Cl.
CPC ...
H04R 17/00 (2006.01); H03H 9/205 (2006.01); H03H 9/56 (2006.01); H03H 9/64 (2006.01); H03H 9/15 (2006.01); H03H 9/17 (2006.01); H03H 9/54 (2006.01); H03H 9/60 (2006.01); H03H 3/00 (2006.01); H03H 3/007 (2006.01);
U.S. Cl.
CPC ...
H03H 9/205 (2013.01); H03H 9/568 (2013.01); H03H 9/6483 (2013.01); H03H 9/15 (2013.01); H03H 9/178 (2013.01); H03H 9/54 (2013.01); H03H 9/605 (2013.01); H03H 3/00 (2013.01); H03H 3/0073 (2013.01);
Abstract

A method of manufacturing a ladder filter including first and second resonators includes: forming a piezoelectric film on an entire surface of a substrate that has respective lower electrodes of the first and second resonator formed thereon, an conductive film on the piezoelectric film, and a second film on the conductive film; forming a pattern of the second film in a prescribed region in the second area; forming a first film on an entire surface of the substrate; etching the first film, forming a pattern of the first film, the second film and the conductive film in the second area, and forming a pattern of the first film and the conductive film in the first area, to form respective upper electrodes from the conductor film; and thereafter, etching the piezoelectric film to form respective patterns of the piezoelectric film in the first and second areas, respectively.

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