The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jan. 06, 2009
Atsushi Kobayashi, Seto, JP;
Hiroaki Suzuki, Tajimi, JP;
Ichiro Ando, Kasugai, JP;
Menicon Co., Ltd., Nagoya-Shi, JP;
Abstract
A novel manufacturing method for a diffraction lens, whereby aperture and eccentricity effects can be suppressed and any multi-focusing effect can also be obtained in a more stable manner. A synchronous structure is set up where at least two reliefs whose first order diffracted lights give respective focal distances different from one another are set to overlap with each other in at least a part of an area in a radial direction of a diffraction lens, and with respect to every grating pitches of one relief having the maximum grating pitch among the reliefs set up in overlap, grating pitches of another relief are overlapped periodically; and the resulting relief pattern is formed on a surface of an optical material.