The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Mar. 28, 2012
Timothy J. Dalton, Ridgefield, CT (US);
Bruce B. Doris, Brewster, NY (US);
Ho-cheol Kim, San Jose, CA (US);
Carl J. Radens, LaGrangeville, NY (US);
Timothy J. Dalton, Ridgefield, CT (US);
Bruce B. Doris, Brewster, NY (US);
Ho-Cheol Kim, San Jose, CA (US);
Carl J. Radens, LaGrangeville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled with a filler material and a second layer is deposited above the first layer containing the first nanoscale nested line structure. A second nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running in a second direction is formed from second self-assembling block copolymers within the second layer. The composite pattern of the first nanoscale nested line structure and the second nanoscale nested line structure is transferred into an underlayer beneath the first layer to form an array of structures containing periodicity in two directions.