The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jun. 20, 2008
Junichi Taniguchi, Kyoto, JP;
Junichi Taniguchi, Kyoto, JP;
Shimadzu Corporation, Kyoto-Shi, JP;
Abstract
In performing an isolation of specific ions or performing a dissociation operation by CID, ions are captured by applying a radio-frequency high voltage to a ring electrodeas before. In a cooling operation which is performed immediately before target ions are ejected toward a TOFMS unitwith the ions stored in an ion trap, a radio-frequency high voltage is not applied to the ring electrodebut to end cap electrodesandto capture the ions. In this operation, the frequency thereof is set to be higher than that of the voltage applied to the ring electrodeand the amplitude is also increased in order to assure a large pseudopotential and keep the low mass cutoff (LMC). This narrows the spatial distribution of the cooled ions, reducing the variation of the initial positions of the ions at the point in time when they are ejected, which increases the mass resolution. In addition, since an isolation of ions having a large m/z can be performed with a great qvalue as is conventionally done, a high mass selectivity can be assured.