The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2014

Filed:

Jan. 11, 2005
Applicants:

David E. Burchfield, Rancho Cucamonga, CA (US);

H. William Niu, Rowland Heights, CA (US);

Richard A. Heppner, Claremont, CA (US);

Inventors:

David E. Burchfield, Rancho Cucamonga, CA (US);

H. William Niu, Rowland Heights, CA (US);

Richard A. Heppner, Claremont, CA (US);

Assignee:

Hamilton Sundstrand Corporation, Rockford, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A DMS-IMS chemical sensing system employs two ion-separation technologies in tandem to extract signals of specific chemicals from the glut of signals present. The sensing system generally includes an atmospheric pressure ion generation system, a Differential Mobility (DMS) system, a time-of-flight IMS (TOF-IMS) system, and an ion detector system. The DMS extracts a narrow range of trace chemicals from an environmental sample for subsequent analysis, and a TOF-IMS then analyzes the resulting narrow range of isolated chemicals, allowing compound-specific detection thresholds at sub-ppb concentrations.


Find Patent Forward Citations

Loading…