The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jul. 16, 2009
Applicants:
Eric Tixhon, Crisnee, BE;
Joseph Leclercq, Evere, BE;
Eric Michel, Uckange, FR;
Inventors:
Assignee:
AGC Glass Europe, Brussels, BE;
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); B05D 3/14 (2006.01); H05H 1/20 (2006.01); C03C 17/00 (2006.01);
U.S. Cl.
CPC ...
C03C 17/002 (2013.01); C03C 17/001 (2013.01); C03C 16/509 (2013.01); C03C 16/54 (2013.01);
Abstract
A process for depositing a film onto a substrate (), which comprises in particular introducing a substrate () into a reaction chamber (), in which at least two electrodes () are placed. A high-frequency electrical voltage is generated, said voltage being such that it generates filamentary plasma () between the two electrodes (). An adjustable inductor (L) placed in parallel with the inductor of the installation generating the electrical voltage is employed so as to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma ().