The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2014

Filed:

Dec. 23, 2008
Applicants:

Werner Pohl, Essen, DE;

Christoph Stegemann, Unna, DE;

Thomas Steinmetz, Dortmund, DE;

Sami Pelkonen, Dortmund, DE;

Inventors:

Werner Pohl, Essen, DE;

Christoph Stegemann, Unna, DE;

Thomas Steinmetz, Dortmund, DE;

Sami Pelkonen, Dortmund, DE;

Assignee:

UHDE GmbH, Dortmund, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C02F 1/00 (2006.01); C02F 1/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for removing silicon compounds from aqueous NaCl brine includes, first, adjusting a weak brine to a pH value of less than 3 with hydrochloric acid. Iron(III) chloride or other trivalent iron ions are added to the acidified weak brine, the obtained weak brine is then continuously fed to a stirred dissolution vessel which contains undissolved salt in addition to brine. Fresh salt is charged batch-wise and intermittently to the dissolution vessel to produce strong brine. The obtained strong brine is fed to a stirred buffer vessel, the pH value in this buffer vessel being maintained at a level ranging from 5 to 8. A strong-brine flow is continuously withdrawn from the buffer vessel and filtered, and the filtrate containing the added iron and silicon is discharged. Also a system for carrying out this process is disclosed.


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