The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Jul. 19, 2007
Applicants:
Hiroyuki Kousaka, Nagoya, JP;
Hitoshi Iida, Nagoya, JP;
Noritsugu Umehara, Nagoya, JP;
Inventors:
Assignee:
National University Corporation Nagoya University, Nagoya-shi, Aichi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
Abstract
To generate plasma inside a tube of a small opening diameter and perform plasma processing inside the tube. A plasma processing deviceis formed by a chamber () and a microwave generation device (). A microwave is introduced into the chamber via a quartz tube (). A tube holder () is arranged inside the quartz tube (). Two holes are formed in the side surface of the tube holder (). A tube () of a small opening diameter is fixed to the end of the tube holder ().