The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jan. 31, 2012
Jerry Alan Pickering, Hilton, NY (US);
Donald Saul Rimai, Webster, NY (US);
Jerry Alan Pickering, Hilton, NY (US);
Donald Saul Rimai, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A gloss-watermark pattern is produced on a rotatable fixing member including a thermoplastic layer having a surface and a selected thickness. Particles having a Young's modulus of at least 1 GPa are applied in a selected deposition pattern to a selected area of the surface. The applied particles are pressed against a pressure member so that the applied particles indent the surface to form the gloss-watermark pattern. At least some of the pressed particles are removed from the surface. After the removing step, a printed image on a receiver can be fixed using the fixing member having the gloss-watermark pattern. The printed image can include toner, phase-change ink, or hot-melt ink, so that a gloss watermark corresponding to the gloss-watermark pattern is formed on the printed image by the fixing process.