The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Sep. 06, 2012
Applicant:
Haruko Akutsu, Yokosuka, JP;
Inventor:
Haruko Akutsu, Yokosuka, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01J 37/26 (2006.01); H01J 37/24 (2006.01); H01J 37/28 (2006.01); H01J 37/244 (2006.01); G01N 23/22 (2006.01); G01N 23/225 (2006.01);
U.S. Cl.
CPC ...
H01J 37/263 (2013.01); H01J 37/26 (2013.01); H01J 37/24 (2013.01); H01J 37/28 (2013.01); H01J 37/244 (2013.01); G01N 23/22 (2013.01); G01N 23/2251 (2013.01); H01J 2237/221 (2013.01);
Abstract
In accordance with an embodiment, a sample analyzing apparatus includes a charged beam generating unit, a detecting unit, and an analyzing unit. The charged beam generating unit is configured to generate a charged beam and apply the charged beam to a sample. The detecting unit is configured to detect charged particles and then output a signal, the charged particles being generated from the sample by the application of the charged beam in a manner depending on a three-dimensional structure and material characteristics of the sample. The analyzing unit is configured to process the signal to analyze the sample.