The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8748210 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 10, 2014

Filed:

Dec. 07, 2012
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Takeshi Aoki, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/148 (2006.01); H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device comprises a semiconductor substrate, and a multilayer wiring structure arranged on the semiconductor substrate, the multilayer wiring structure including a plurality of first electrically conductive lines, an insulating film covering the plurality of first electrically conductive lines, and a second electrically conductive line arranged on the insulating film so as to intersect the plurality of first electrically conductive lines, wherein the insulating film has gaps in at least some of a plurality of regions where the plurality of first electrically conductive lines and the second electrically conductive line intersect each other, and a width of the gap in a direction along the second electrically conductive line is not larger than a width of the first electrically conductive line.


Find Patent Forward Citations

Aoki, Takeshi. (2014). Method of manufacturing semiconductor device having air gaps in multilayer wiring structure (U.S. Patent No. 8748210). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8748210

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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