The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jul. 25, 2008
Jeng-hao Pai, Chapel Hill, NC (US);
Yuli Wang, Cary, NC (US);
Christopher E. Sims, Chapel Hill, NC (US);
Mark Bachman, Irvine, CA (US);
Nancy Allbritton, Chapel Hill, NC (US);
Guann-pyng LI, Irvine, CA (US);
Jeng-Hao Pai, Chapel Hill, NC (US);
Yuli Wang, Cary, NC (US);
Christopher E. Sims, Chapel Hill, NC (US);
Mark Bachman, Irvine, CA (US);
Nancy Allbritton, Chapel Hill, NC (US);
Guann-Pyng Li, Irvine, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
Systems and methods directed to the use 1002F to build microdevices and biomedical devices. Through the addition of a photosensitizing agent, Epon epoxy resin 1002F can be linked in the presence of UV light, making it useful as a photoresist or as a micropatternable structural material. One embodiment comprises combining 1002F monomer resin with a solvent and a photoinitiator, placing the monomer solution on a surface, exposing the monomer solution to UV light through a mask to initiate linking, and stripping the unlinked polymer away. In another embodiment, 3-D structures are built using two or more layers of sensitized monomer films, each having different sensitivity to light, and the use of a mask containing opaque and semi-opaque regions.