The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jan. 23, 2009
Mark Phillip D'evelyn, Santa Barbara, CA (US);
John Dewey Blouch, Glenville, NY (US);
Ludwig Christian Haber, Rutland, MA (US);
Hongying Peng, Schenectady, NY (US);
David Dils, Benbrook, TX (US);
Svetlana Selezneva, Schenectady, NY (US);
Kristi Jean Narang, Voorheesville, NY (US);
Mark Phillip D'Evelyn, Santa Barbara, CA (US);
John Dewey Blouch, Glenville, NY (US);
Ludwig Christian Haber, Rutland, MA (US);
Hongying Peng, Schenectady, NY (US);
David Dils, Benbrook, TX (US);
Svetlana Selezneva, Schenectady, NY (US);
Kristi Jean Narang, Voorheesville, NY (US);
Lockheed Martin Corporation, Bethesda, MD (US);
Abstract
An apparatus and methods for forming a diamond film, are provided. An example of an apparatus for forming a diamond film includes an electrodeless microwave plasma reactor having a microwave plasma chamber configured to contain a substrate and to contain a reactant gas excited by microwaves to generate a microwave plasma discharge. Gas injection ports extend through an outer wall of the plasma chamber at a location upstream of the plasma discharge and above the substrate. Gas jet injection nozzles interface with the gas injection ports and are configured to form a directed gas stream of reactant gas having sufficient kinetic energy to disturb a boundary layer above an operational surface of the substrate to establish a convective transfer of the film material to the operational surface of the substrate.