The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Apr. 13, 2010
Seiichi Takaoka, Osaka, JP;
Kumie Yamana, Osaka, JP;
Seiichi Takaoka, Osaka, JP;
Kumie Yamana, Osaka, JP;
Nitto Denko Corporation, Osaka, JP;
Abstract
Provided is a process by which an electret material having excellent thermal resistance of charge retentivity can be obtained. The process for producing an electret material of the invention includes an irradiation step, a formation step, and a charging step. In the irradiation step, a dispersion containing fine polytetrafluoroethylene particles is irradiated with γ rays. In the formation step, the dispersion which has been irradiated with γ rays is applied to an electrode plate and then dried, and the fine polytetrafluoroethylene particles are sintered to form a polytetrafluoroethylene layer on the electrode plate. In the charging step, the surface of the polytetrafluoroethylene layer is subjected to a charging treatment.