The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jan. 09, 2012
Hyung Sang Park, Seoul-si, KR;
Seung Woo Choi, Cheonan-si, KR;
Jong Su Kim, Cheonan-si, KR;
Dong Rak Jung, Cheonan-si, KR;
Jeong Ho Lee, Seoul-si, KR;
Chun Soo Lee, Daejeon-si, KR;
Hyung Sang Park, Seoul-si, KR;
Seung Woo Choi, Cheonan-si, KR;
Jong Su Kim, Cheonan-si, KR;
Dong Rak Jung, Cheonan-si, KR;
Jeong Ho Lee, Seoul-si, KR;
Chun Soo Lee, Daejeon-si, KR;
ASM Genitech Korea Ltd., , KR;
Abstract
A deposition apparatus configured to form a thin film on a substrate includes: a reactor wall; a substrate support positioned under the reactor wall; and a showerhead plate positioned above the substrate support. The showerhead plate defines a reaction space together with the substrate support. The apparatus also includes one or more gas conduits configured to open to a periphery of the reaction space at least while an inert gas is supplied therethrough. The one or more gas conduits are configured to supply the inert gas inwardly toward the periphery of the substrate support around the reaction space. This configuration prevents reactant gases from flowing between a substrate and the substrate support during a deposition process, thereby preventing deposition of an undesired thin film and impurity particles on the back side of the substrate.