The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Aug. 03, 2010
Kentaro Matsunaga, Tokyo, JP;
Tomoya Oori, Mie-ken, JP;
Eishi Shiobara, Mie-ken, JP;
Yukiko Sato, Kanagawa-ken, JP;
Yoshihisa Kawamura, Kanagawa-ken, JP;
Kentaro Matsunaga, Tokyo, JP;
Tomoya Oori, Mie-ken, JP;
Eishi Shiobara, Mie-ken, JP;
Yukiko Sato, Kanagawa-ken, JP;
Yoshihisa Kawamura, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a pattern formation method is disclosed. The method includes forming a plurality of regions on a foundation and the plurality of the regions correspond to different pattern sizes. The method includes separating each of a plurality of block copolymers from another one of the plurality of the block copolymers and segregating the each of the plurality of the block copolymers into a corresponding one of the regions. The method includes performing a phase separation of the each of the block copolymers of each of the regions. The method includes selectively removing a designated phase of each of the phase-separated block copolymers to form a pattern of the each of the block copolymers and the pattern has a different pattern size for the each of the regions.