The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2014

Filed:

Nov. 26, 2009
Applicant:

Roland Franz, Fuenfstetten, DE;

Inventor:

Roland Franz, Fuenfstetten, DE;

Assignee:

Grenzebach Maschinenbau GmbH, Asbach-Baeumenheim, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method and to a device for reversing the feeding of a sputter coating system, particularly when coating a photovoltaic module, in clean rooms, having the following characteristics: a) a transport frame () for receiving a substrate wafer () of a photovoltaic module, b) a rotary device having means for mounting the transport frame (), having means for rotating the transport frame (), and having means for transporting the transport frame (), c) means for precisely aligning the rotary device relative to the sputter coating system, d) a detection device () for checking a sputter process, and computer program having a program code for performing the process steps.


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Franz, Roland. (2014). Method and device for reversing the feeding of sputter coating systems in clean rooms (U.S. Patent No. 8747627). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8747627

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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